ARCNL

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Are you a student in physics or chemistry looking for
an internship? Or are you a graduate in physics or chemistry and interested in a PhD position that allows you to combine curiosity driven research with a clear application? Then consider joining our team at the Advanced Research Center for Nanolithography (ARCNL).  

Our mission
At ARCNL we focus on the fundamental physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry.   

What can you expect?
As a researcher at ARCNL, you will frequently interact with industrial partner ASML. This means that you will experience firsthand how curiosity driven research is used to enable the production of ever smaller and smarter electronics. We are a young and vibrant organization where people with a shared passion find each other. Opportunities to talk to fellow researchers and senior group leaders are plentiful. Your own research group will be small (about 8 people) facilitating close collaboration. At ARCNL you are surrounded by excellent scientists and dedicated technicians who know the equipment well.  

Research focus
EUV lithography is currently the most promising new technology for semiconductor production. We therefore mainly focus on the physics that is central to the generation of high intensities of extreme ultraviolet light and its use in nanolithography. We try to be the first to understand and control certain physical processes at the atomic scale and beyond. Over time our program will evolve so that we can remain at the frontier of nanolithography research.  

More details

ARCNL was founded in 2014 and has since grown into a research center with over fifty people working in nine research groups. We recently moved to a brand new building: Matrix VII at Amsterdam Science Park. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML.